| Three-Dimensional (3-D) Plastic Part Extrusion And Conductive Ink Printing For Flexible Electronics |
Apr 2012 |
52 pages |
| Authors:
Tracy D Hudson; Carrie D Hill; ARMY AVIATION AND MISSILE RESEARCH DEVELOPMENT AND ENG CTR REDSTONE ARSENAL AL WEAPONS SCIENCES DIRECTORATE
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 | Processes for using a MakerBot Computer Numerical Control (CNC) machine and Fujifilm Dimatix Materials Printer (DMP) were developed to facilitate future research in integrating electronics into structural features. In this project, the concept of structural electronics, or structronics, was investigated. Structronics seek to build wiring and electrical interconnects directly into component structures to diminish the need for structural fasteners. A MakerBot Cupcake CNC was used to investigate the fabrication of ... |
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| Sentinel Reportable Medical Events, Service Members and Other Beneficiaries of the U.S. Military Health System, First Calendar Quarter, 2012 Versus 2011 |
Apr 2012 |
5 pages |
| Authors:
ARMED FORCES HEALTH SURVEILLANCE CENTER SILVER SPRING MD
|
| Department of Defense policy mandates the reporting of cases of 67 different diseases and injuries whose occurrence may represent a significant threat to public health and military operations. The chart below depicts the numbers of cases of selected conditions which were reported through service-specific electronic reporting systems. For each condition, the bars represent the numbers of cases among service members and among other health care beneficiaries (retirees, family members) during ... |
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| Deployment-Related Conditions of Special Surveillance Interest, U.S. Armed Forces, by Month and Service, January 2003 - January 2012 (data as of 23 February 2012) |
Feb 2012 |
5 pages |
| Authors:
ARMED FORCES HEALTH SURVEILLANCE CENTER SILVER SPRING MD
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| Th e numbers of OEF/OIF/OND deployment-associated conditions in this report differ from those previously published in the MSMR. The change reflects an adjustment in the manner in which service members deployments were associated with OEF/OIF/OND. The net effect is to decrease the numbers of service members with the conditions of interest who could be identified as having deployed to OEF/OIF/OND. |
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| Conceptual and Laboratory Exercise to Apply Newton's Second Law to a System of Many Forces |
Jan 2012 |
15 pages |
| Authors:
Carl E Mungan; NAVAL ACADEMY ANNAPOLIS MD DEPT OF PHYSICS
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| A pair of objects on an inclined plane are connected together by a string. The upper object is then connected to a fixed post via a spring. The situation is first analysed as a classroom exercise in using free-body diagrams to solve Newton's second law for a system of objects upon which many different kinds of force are acting (string tension, spring force, gravity, normal force and friction). Next, the ... |
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| Nondestructive Evaluation (NDE) Exploratory Development for Air Force Systems. Delivery Order 0001: Quick Reaction NDE and Characterization--Effects of Chemical Effects of Chemical Etching after Pre-Inspection Mechanical Cleaning on Fluorescent Penetrant |
Aug 2011 |
78 pages |
| Authors:
Noel A Tracy; UNIVERSAL TECHNOLOGY CORP DAYTON OH
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| A study was conducted to gather data on the ability of etching to recover FPI crack indications degraded by mechanically cleaning cracked specimens made of Ti-6Al-4V and Inconel 718. The data showed that minimal etching does not sufficiently overcome the deleterious effects of certain mechanical cleaning methods to provide for a subsequent reliable fluorescent-penetrant inspection, and the amount of etching required to recover some crack indications would not be allowed ... |
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| The Economics of Managed Print and Imaging Services |
JUN 2011 |
91 pages |
| Authors:
Carl R. Blazek; Jesse K. Taijeron; NAVAL POSTGRADUATE SCHOOL MONTEREY CA
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| To facilitate a baseline economic assessment, the concept of Managed Print and Imaging Services (MPIS) is introduced first. Next, a transferable process to determine the most economical print and imaging option is outlined so that NAVSISA, as well as other organizations, can utilize it. A baseline economic assessment of NAVSISA s current nonstandardized procurement and use of print and imaging services follows. This data is then compared to the total ... |
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| Fabrication of Three-Dimensional Imprint Lithography Templates by Colloidal Dispersions |
06 Mar 2011 |
10 pages |
| Authors:
A M Almanza-Workman; Carl P Taussig; Albert H Jeans; Robert L Cobene; HEWLETT-PACKARD LABS PALO ALTO CA
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| Self-aligned imprint lithography (SAIL) enables patterning and alignment of submicron-sized features on flexible substrates in the roll-to-roll (R2R) environment. Soft molds made of elastomers have been used as stamps to pattern three-dimensional masks. Durability of these stamps is one factor that limits their efficiency in a R2R process. Fluorothermoplastics are low cost imprint stamp materials with great mechanical strength and chemical compatibility but with low gas permeability that trap air ... |
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| Defect Analysis of Roll-to-Roll SAIL Manufactured Flexible Display Backplanes |
Jan 2011 |
6 pages |
| Authors:
Carl Taussig; Richard E Elder; Warren B Jackson; Albert Jeans; Mehrban Jam; Ed Holland; Hao Luo; John Maltabes; Craig Perlov; Steven Trovinger; HEWLETT-PACKARD LABS PALO ALTO CA
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| HP and Phicot have made the world's first roll-to-roll (R2R) manufactured active matrix displays. Currently we are developing a wrist-worn solar powered display for the U.S. Army. As we scale from research to preproduction on our 1/3 meter wide pilot line defect analysis and mitigation is our primary focus. In this presentation we will review the self-aligned imprint lithography (SAIL) process and discuss defects we observe, and the tools, and ... |
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| Structural Consequences of Ferroelectric Nanolithography |
Jan 2011 |
10 pages |
| Authors:
Ji Young Jo; Pice Chen; Rebecca J Sichel; Seung-Hyub Baek; Ryan T Smith; Nina Balke; Sergei V Kalinin; Martin V Holt; Joerg Maser; Kenneth Evans-Lutterodt; Chang-Beom Eom; Paul G Evans; WISCONSIN UNIV-MADISON BOARD OF REGENTS/RESEARCH SPONSORED PROGRAMS
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| Domains of remnant polarization can be written into ferroelectrics with nanoscale precision using scanning probe nanolithography techniques such as piezoresponse force microscopy (PFM). Understanding the structural effects accompanying this process has been challenging due to the lack of appropriate structural characterization tools. Synchrotron X-ray nanodiffraction provides images of the domain structure written by PFM into an epitaxial Pb(Zr,Ti)O3 thin film and simultaneously |
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| Inkjet Printing of Anode Supported SOFC: Comparison of Slurry Pasted Cathode and Printed Cathode (POSTPRINT) |
Feb 2010 |
6 pages |
| Authors:
Thomas L Reitz; Ryan M Miller; A M Sukeshini; Ryan Cummins; AIR FORCE RESEARCH LAB WRIGHT-PATTERSON AFB OH PROPULSION DIRECTORATE
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| Solid oxide fuel cells (SOFCs) were fabricated by depositing NiO/yttria-stabilized zirconia (YSZ) anode interlayer, YSZ electrolyte layer, and strontium-doped lanthanum manganate (LSM)-YSZ and LSM cathode layers on a NiO-YSZ support using an inkjet printing method with potential for high reproducibility and design flexibility. The cells exhibited a stable open-circuit voltage of 1.1 V and a maximum power density of 430-460 mW/cm2 at 850 degrees C for hydrogen. For comparison, cells ... |
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| Simulation Based Performance Comparison of Transistors Designed using Standard Photolithographic and Coarse Printing Design Specifications |
Jan 2010 |
8 pages |
| Authors:
W T Wondmagegn; N T Satyala; H J Stiegler; M A Quevedo-Lopez; E W Forsythe; R J Pieper; B E Gnade; ARMY RESEARCH LAB ADELPHI MD
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| In this work a simulation based comparative study of organic field effect transistors designed using standard lithographic and printing designs is presented. The device simulations were performed using two dimensional drift-diffusion equations with a Poole-Frenkel field dependent mobility model. Both photolithographic and coarse printing transistor designs employed common materials such as 150 nm thick pentacene, 150 nm thick parylene gate insulator, gold source-drain electrodes and aluminum gate electrodes. The major ... |
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| UV-LIGA Microfabrication of 220 GHz Sheet Beam Amplifier Gratings with SU-8 Photoresists |
Jan 2010 |
13 pages |
| Authors:
Colin D Joye; Jeffrey P Calame; Morag Garven; Baruch Levush; NAVAL RESEARCH LAB WASHINGTON DC
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| Microfabrication techniques have been developed using ultraviolet photolithography (UV-LIGA) with SU-8 photoresists to create advanced sheet beam amplifier circuits for the next generation of vacuum electron traveling wave amplifiers in the 210-220 GHz (G-band) frequency regime. We describe methods that have led to successfully fabricated millimeter wave circuits, including applying ultra-thick SU-8 photoresist layers on copper, copper electroforming solutions, and the challenging removal of the SU-8 photoresists. A table of ... |
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| Interference Lithography for Optical Devices and Coatings |
Jan 2010 |
126 pages |
| Authors:
Abigail T Juhl; ILLINOIS UNIV AT URBANA DEPT OF MATERIALS SCIENCE AND ENGINEERING
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| Interference lithography can create large-area, defect-free nanostructures with unique optical properties. In this thesis, interference lithography will be utilized to create photonic crystals for functional devices or coatings. For instance, typical lithographic processing techniques were used to create 1, 2 and 3 dimensional photonic crystals in SU8 photoresist. These structures were in-filled with birefringent liquid crystal to make active devices, and the orientation of the liquid crystal directors within the ... |
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| Approaches to Improving Transmon Qubits |
15-Dec-2009 |
8 pages |
| Authors:
Bryan Jacobs; JOHNS HOPKINS UNIV LAUREL MD APPLIED PHYSICS LAB
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| Progress (1) We have completed fabrication at JHU/APL of a variety of microwave resonator cavities. The devices have been diced and are ready for use. We have: a. Sapphire substrate, aluminum lift-off b. Sapphire substrate, niobium lift-off c. 110 silicon substrate, aluminum lift-off d. 110 silicon substrate, niobium lift-off (2) The machine shop finished fabrication of our specially-designed evaporator jig to allow double-angle evaporation (to form the transmon with a ... |
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| Defense Acquisitions. Measuring the Value of DOD's Weapon Programs Requires Starting with Realistic Baselines |
01-Apr-2009 |
23 pages |
| Authors:
John Oppenheim; Ron Schwenn; Bruce Fairbairn; Michael J Sullivan; Susan Neill; Ridge Bowman; Cheryl Andrew; GOVERNMENT ACCOUNTABILITY OFFICE WASHINGTON DC
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| We have conducted a body of work that examines weapon acquisition issues from a perspective that draws upon lessons learned from best practices in product development. Collectively, these practices comprise a process that is anchored in knowledge. Achieving the right knowledge at the right time enables leadership to make informed decisions about when and how best to move into various expensive acquisition phases. In essence, knowledge supplants risk over time. ... |
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| Semiconductor Quantum Dot Structures for Integrated Optic Switches |
23-Dec-2008 |
8 pages |
| Authors:
Patrick LiKamWa; UNIVERSITY OF CENTRAL FLORIDA ORLANDO OFFICE OF RESEARCH
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| Quantum dot structures have been produced by etching pillars in GaAs/AlGaAs multiple quantum well structures. The pillars as tall as 1?m and with diameter as small as 40nm were defined using direct write electron beam lithography in combination with inductively coupled plasma reactive ion etching. Waveguide structures containing quantum dot regions integrated with disordered MQW sections have been fabricated. These integrated waveguides have been tested in our laboratory and have ... |
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| Novel Presentation Methods for Technical Data |
Nov-2008 |
166 pages |
| Authors:
Krystal Thomas; David S Ebert; Sungye Kim; Insoo Woo; Ross Maciejewski; PURDUE UNIV LAFAYETTE IN SCHOOL OF ELECTRICAL AND COMPUTER ENGINEERING
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| This project developed effective visualization techniques for 2D technical data diagrams, such as schematic/wiring diagrams for use in maintenance, repair, and training. The techniques have been integrated into the Schematic Diagram Visualization (SDViz) software system that has numerous features to aid in navigation, diagnosis of faults, and traversal of multiple linked diagrams. These features include highlighting relationships between components and connectors, maintaining context between several related diagrams, animation of electrical/fluid/air ... |
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| Innovative Technologies for Maskless Lithography and Non-Conventional Patterning |
01-Aug-2008 |
21 pages |
| Authors:
Avideh Zakhor; Andrew Neureuther; R F Pease; Olav Solgaard; Vivek Subramanian; Jeffrey Bokhor; Jean Frechet; CALIFORNIA UNIV BERKELEY SPONSORED PROJECTS OFFICE
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| Collaborative research was conducted by the faculty known as the Lithography Network. This network brings together world class researchers over a broad set of technology areas essential to the success of maskless lithography and non-conventional patterning. The primary faculty by task is listed below: Task 1: Electron Beam Technology for Maskless Lithography, Professor R. Fabian Pease (Coordinator); Task 2: Spatial Light Modulators for Maskless lithography, Professor Olav Solgaard (Coordinator); Professor ... |
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| Data Compression for Maskless Lithography Systems: Architecture, Algorithms and Implementation |
19 May 2008 |
169 pages |
| Authors:
Vito Dai; CALIFORNIA UNIV BERKELEY DEPT OF ELECTRICAL ENGINEERING AND COMPUTER SCIENCE
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| Future lithography systems must produce more dense microchips with smaller feature sizes, while maintaining throughput comparable to today's optical lithography systems. This places stringent data-handling requirements on the design of any maskless lithography system. Today's optical lithography systems transfer one layer of data from the mask to the entire wafer in about sixty seconds. To achieve a similar throughput for a direct-write maskless lithography system with a pixel size of ... |
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| Field Emission Properties of Carbon Nanotube Pillar Arrays Patterned Directly on Metal Alloy Surfaces |
Apr-2008 |
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| Authors:
Mahmud Rahman; M Meyyappan; Cattien V Nguyen; Jessica L Killian; Darrell L Niemann; Nathaniel Zuckerman ;Jeremy Silan; Bryan P Ribaya; ELORET CORP MOFFETT FIELD CA NASA AMES RESEARCH CENTER
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 | Carbon nanotube pillar arrays (CPAs) for cold field emission were fabricated using a conventional photolithography process, and the geometry of these arrays was studied and the effect of pillar height on field emission was quantified. Our CPA samples achieved turn-on fields as low as 0.9 V/micrometer and stable current densities of 10 mA/cm(2) at applied field lower than 6V/micrometer. |
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| Projecting Deep-Subwavelength Patterns from Diffraction-Limited Masks Using Metal-Dielectric Multilayers |
Jan 2008 |
4 pages |
| Authors:
Yi Xiong; Zhaowei Liu; Xiang Zhang; CALIFORNIA UNIV BERKELEY NANOSCALE SCIENCE AND ENGINEERING CENTER
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| We utilize a metal-dielectric multilayer structure to generate deep-subwavelength one-dimensional and two-dimensional periodic patterns with diffraction-limited masks. The working wavelength and the pattern are set by the flexible design of the multilayer structure. This scheme is suitable to be applied to deep-subwavelength photolithography. As an example, we numerically demonstrate pattern periods down to 50 nm under 405 nm light illumination. |
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| Novel Pixilated Polarimeter and Associated Nanoimprinting Techniques, to Address Advanced Imaging Applications |
15-Jun-2007 |
40 pages |
| Authors:
Jian J Wang; Jay L Guo; NANOOPTO CORP SOMERSET NJ
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| The final objective of this contract is to improve nano-optical sub-components and then further to demonstrate a monolithically integrated nano-optical pixilated-array polarimeter. In parallel, part of the goal of this project is also to develop a low-cost web-to-web nanoimprint system/method/process for more efficiently making low-cost nano-structured optical devices directly onto plastic sheets. In the final report, we will report and summarize all the results and progresses which we have made ... |
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| Fabrication of Nanoscaled Systems |
MAY 2007 |
10 pages |
| Authors:
R. Hull; L. Harriott; P. Parrish; G. Snider; VIRGINIA UNIV CHARLOTTESVILLE OFFICE OF SPONSORED PROGRAMS
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| The main goal of this project was to develop new lithographic and nanofabrication approaches for the assembly of novel nanoelectronic and nanomagnetic device structures. Our team's interests, expertise and facilities spanned materials synthesis, nanoscale characterization, nanoscale lithography and processing, and involved three institutions (University of Virginia, Notre Dame University, Lund University). To fabricate annular structures of giant magnetoresistive material for proposed vertical magnetic random access memory structures, we explored use ... |
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| Maskless Lithography Using Surface Plasmon Enhanced Illumination |
30 APR 2007 |
4 pages |
| Authors:
Dale Larson; HARVARD COLL CAMBRIDGE MA PRESIDENT AND FELLOWS
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| The ability of surface plasmon enhanced illumination (SPEI) devices to use visible wavelengths to expose photoresist with subwavelength features has been demonstrated and a manuscript is being prepared for submission to PNAS. The SPEI devices consist of a regular array of nanometric features in a metal/dielectric laminate device that transmit light via extraordinary optical transmission (EOT) with a semicollimated beam of light. This beam of light is scanned across a ... |
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| A 10,000-Pen Nanoplotter with Integrated Ink Delivery System |
03 MAR 2007 |
26 pages |
| Authors:
Chad A. Mirkin; NORTHWESTERN UNIV EVANSTON IL DEPT OF CHEMISTRY
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| This report summarizes major scientific and technological accomplishments during the three years of this grant. It includes an extensive list of articles published in peer reviewed journals and participation in scientific meetings, workshops, and lectures. Finally, patent disclosures, transitions, and awards earned by the participating investigators are listed. Over the three-year project period significant progress has been made in both areas. The Liu group took the lead in developing new ... |
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| Lithographically-Scribed Planar Holographic Optical CDMA Devices and Systems |
15 FEB 2007 |
58 pages |
| Authors:
Thomas Mossberg; LIGHTSMYTH TECHNOLOGIES INC EUGENE OR
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| Recent advances in photo lithographic fabrication and planar waveguides have created a powerful opportunity. For the First time it is possible to generate arbitrary computer-designed. waveguide volume holograms and to do so robustly and at low cost. Holographic Bragg Reflectors (HBRs) comprise an exemplary lithographically scribed fully integrated holographic device useful for multiplexing of wavelength differentiated optical signals and general purpose spectral filtering. HBRs provide both a flexible spectral filtering ... |
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| Device Demonstration |
31 DEC 2006 |
190 pages |
| Authors:
BAE SYSTEMS ELECTRONICS AND INTEGRATED SOLUTIONS NASHUA NH
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| The goal of the Defense Advanced Research Projects Agency (DARPA) Advanced Lithography research program was to revolutionize semiconductor lithography through accelerated research of highly innovative approaches that would enable pattern transfer to wafers of features 100 nm and below. To this end, DARPA, via a Broad Agency Announcement, BAA 00-04, solicited proposals for R&D to understand and overcome specific technological obstacles to the realization of lithography for critical dimensions of ... |
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| A Hybrid Nano-Imprinting Lithography Method for Nano-Patterning Based on Infrared Pulsed Laser Heating |
05 SEP 2006 |
14 pages |
| Authors:
Yung-Chun Lee; NATIONAL CHENG KUNG UNIV TAINAN (TAIWAN) DEPT OF MECHANICAL ENGINEERING
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| In this research project we present a novel method of nano-imprinting which adopts important features of conventional nano-imprinting lithography (NIL) and the newly developed laser-assisted direct imprinting (LADI) method. It utilizes an Nd-YAG pulsed laser of wavelength 1064 nm which can easily penetrate and also heat up a silicon mold which is pressed against a resist layer deposited on a substrate. The fast rising temperature in the silicon mold can ... |
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| Combinatorial Analysis of Functional Interfaces and Surfaces Generated Via Dip-Pen Nanolithography |
15 MAY 2006 |
12 pages |
| Authors:
Thomas B. Higgins; HAROLD WASHINGTON COLL CHICAGO IL DEPT OF PHYSICAL SCIENCE
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| The effect of an organic solvent atmosphere on ink deposition and deposition transport rate was studied and quantified. Various chemical compounds spanning a range of hydrophobicities and meniscus solubilities were used as inks in DPN and deposited in a variety of solvent atmospheres such as ethanol, methanol, hexanes and methylene chloride. The data obtained in these experiments will improve our understanding of the factors that govern the rate of ink ... |
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| Characteristics of Two-Dimensional Triangular and Three-Dimensional Face-Centered-Cubic Photonic Crystals |
MAR 2006 |
182 pages |
| Authors:
Jeffrey D. Clark; AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OH SCHOOL OF ENGINEERING AND MANAGEMENT/DEPT OF ENGINEERING PHYSICS
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| The fabrication of photonic crystals (PhC) with photonic band gaps (PBG) in the visible range is a difficult task due to the small structural feature sizes of the PhC. The particular type of PhC examined is a two-dimensional (2-D) triangular structure with a PBG designed for visible wavelengths with applications in visible integrated photonic systems. This work examines the processes involved and viability of fabricating 2-D triangular PhC's by a ... |
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| Gray-Scale Lithography for MEMS Applications |
2006 |
3 pages |
| Authors:
Christopher M. Waits; Reza Ghodssi; Madan Dubey; ARMY RESEARCH LAB ADELPHI MD
|
| Micro-electro-mechanical systems (MEMS) fabrication technologies originated directly from integrated circuit (IC) fabrication. IC devices require only two-dimensional or planar structures to be fabricated because there are no mechanical operations taking place. Therefore, structures fabricated for MEMS devices have been traditionally designed with nominally vertical sidewalls (anisotropic etching), undercut sidewalls (wet isotropic etching), or sidewalls that have limited angles due to the crystallographic orientation of the substrate (wet anisotropic etching). A ... |
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| Three-Dimensional Nano-Lithography for Emerging Technologies |
27 SEP 2005 |
11 pages |
| Authors:
Dennis W. Prather; DELAWARE UNIV NEWARK
|
| Grayscale lithography has shown particular success in the pursuit of surface machining capabilities because of the flexibility and convenience it offers in the fabrication of arbitrary three-dimensional surfaces. Accordingly, grayscale lithography has been demonstrated for a wide range of applications, including refractive and diffractive optical elements for focusing and beam shaping, optical interconnects, and MEMS. While our original motivation for this research area was the fabrication of three different micro-optical ... |
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| Ink Jet Printing of Mammalian Primary Cells for Tissue Engineering Applications |
13 JUL 2005 |
6 pages |
| Authors:
Rachel Saunders; Julie Gough; Brian Derby; MANCHESTER UNIV (UNITED KINGDOM) MATERIALS SCIENCE CENTER
|
| A piezoelectric drop on demand printer has been used to print primary human osteoblast and bovine chondrocyte cells. After deposition the cells were incubated at 37 deg C and characterised using optical microscopy, SEM and cell viability assays. Cells showed a robust response to printing exhibiting signs of proliferation and spreading. Increasing the drop velocity results in a reduced cell survival and proliferation rates but both cell types grew to ... |
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| Layer-By-Layer Printing of Cells and its Application to Tissue Engineering |
13 JUL 2005 |
7 pages |
| Authors:
Priya Kesari; Tao Xu; Thomas Boland; CLEMSON UNIV SC
|
| Tissues and organs exhibit distinct shapes and functions nurtured by vascular connectivity. In order to mimic and examine these intricate structure-function relationships, it is necessary to develop efficient strategies for assembling tissue-like constructs. Many of the top-down fabrication techniques used to build microelectromechanical systems, including photolithography, are attractive due to the similar feature sizes, but are not suitable for delicate biological systems or aqueous environments. A layer-by layer approach has ... |
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| Language, Literacy, and Communication Regarding Medication in an Anticoagulation Clinic: Are Pictures Better Than Words? |
MAY 2005 |
14 pages |
| Authors:
Dean Schillinger; Edward L. Machtinger; Frances Wang; Lay-Leng Chen; Karen Win; Jorge Palacios; Maytrella Rodriguez; Andrew Bindman; AGENCY FOR HEALTHCARE RESEARCH AND QUALITY ROCKVILLE MD
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| Despite the importance of clinician-patient communication for safe medication management, little is known about rates and predictors of medication miscommunication. Measuring rates of miscommunication, as well as differences between verbal and visual modes of assessment, can inform efforts to more effectively communicate about medications. The researchers performed a study among long-term warfarin users in an anticoagulation clinic to assess concordance between patient and clinician reports of patient warfarin regimens. Bilingual ... |
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| Exploiting Parallelism in Geometry Processing with General Purpose Processors and Floating-Point SIMD Instructions |
2005 |
31 pages |
| Authors:
Chia-Lin Yang; Barton Sano; Alvin R. Lebeck; DUKE UNIV DURHAM NC DEPT OF COMPUTER SCIENCE
|
| Three dimensional (3D) graphics applications have become very important workloads running on today's computer systems. A cost-effective graphics solution is to perform geometry processing of 3D graphics on the host CPU and have specialized hardware handle the rendering task. In this paper, we analyze microarchitecture and SIMD instruction set enhancements to a RISC superscalar processor for exploiting parallelism in geometry processing for 3D computer graphics. Our results show that 3D ... |
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| Improving Overlay in Nanolithography with a Deformable Mask Holder |
14 DEC 2004 |
8 pages |
| Authors:
L. R. Harriott; VIRGINIA UNIV CHARLOTTESVILLE DEPT OF ELECTRICAL AND COMPUTER ENGINEERING
|
| In very fine-line VLSI photolithography, alignment and overlay errors due to distortion in the projected image of a photomask relative to an existing pattern on a silicon wafer are becoming such serious problems :hat product-yield is beginning to drop precipitously. We propose to solve these problems by deliberately deforming a mask with a system of piezoelectric actuators in such a way that its induced deformations precisely match those of the ... |
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| Content Repurposing of Electrical Diagrams for Presentation in Handheld Devices |
DEC 2004 |
81 pages |
| Authors:
Vasilios Papaliakos; NAVAL POSTGRADUATE SCHOOL MONTEREY CA
|
| This thesis proposes a design for content repurposing of electrical diagrams for presentation in small-screen wireless handheld devices. Content repurposing is the on-line adaptation of content to fit device capabilities and user's preferences. The focus of this thesis is on electrical diagrams of the schematic type used for maintenance purposes. Nevertheless, many of the proposed techniques are suitable for other technical drawings as well. A significant amount of work has ... |
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| Economics of Electronic Information Provision |
DEC 2004 |
23 pages |
| Authors:
Graham P. Cornish; CORNISH (GRAHAM P) YORKSHIRE (UNITED KINGDOM)
|
| This paper covers the economics of preparing and providing published information. The role of the different players in the publishing chain are examined including authors and their institutions, publishers, reviewers, editors, distributors and users (readers). The costs of acquiring manuscripts, peer review, editing text, and presenting it in an acceptable format will be outlined. The economics of marketing as an aspect of availability will be explored. Different markets will need ... |
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| Accelerating Line of Sight Computation Using Graphics Processing Units |
DEC 2004 |
6 pages |
| Authors:
Brian Salomon; Naga Govindaraju; Avneesh Sud; Russell Gayle; Ming Lin; Dinesh Manocha; Brett Butler; Maria Bauer; Angel Rodriguez; Latika Eifert; Audrey Rubel; Michael Macedonia; NORTH CAROLINA UNIV AT CHAPEL HILL
|
| We present a method to accelerate line-of-sight computation for computer generated forces (CGF) using graphics processing units (GPUs). GPUs have become commodity processors and they are part of every game console or PC system. Moreover, their performance has been increasing at a rate faster than CPUs and the trend is expected to continue in the foreseeable future. We present a hybrid algorithm that exploits the computational power of GPUs to ... |
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| Ejection Forces and Friction Coefficients From Injection Molding Experiments Using Rapid Tooled Inserts |
AUG 2004 |
12 pages |
| Authors:
M. E. Kinsella; B. Lilly; B. Carpenter; K. Cooper; OHIO STATE UNIV COLUMBUS
|
| Experiments have been performed with injection mold inserts made using solid freeform fabrication processes in an effort to further study such applications for economic production of small quantities of parts. Static friction coefficients were determined for HDPE and HIPS against P-20 steel, sintered LaserForm ST- 100, and stereolithography SL 5170 using the ASTM D 1894 standard. Injection mold inserts were constructed of the same three materials and were used to ... |
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| Sub-100nm, Maskless Deep-UV Zone-Plate Array Lithography |
07 MAY 2004 |
154 pages |
| Authors:
Harry I. Smith; MASSACHUSETTS INST OF TECH CAMBRIDGE RESEARCH LAB OF ELECTRONICS
|
| Semiconductor lithography is at a crossroads. With mask set costs in excess of $1M, long mask-turn-around times, and tools that are characterized by their inflexibility and skyrocketing costs (in excess of $20M), there is need for a new paradigm in lithography. Zone-Plate-Array Lithography (ZPAL) bypasses some of the most pressing problems of current lithography equipment by offering a maskless lithography tool that is scalable, flexible and low cost. It is ... |
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| Sub 50nm Critical Dimension Lithography Using Surface Plasmon Enhanced Illumination |
30 APR 2004 |
10 pages |
| Authors:
HARVARD MEDICAL SCHOOL BOSTON MA
|
| Surface plasmon enhanced illumination Is a photonics device that creates a nanometric source of bright propagating light. This light source serves as the basis for a direct write maskless photolithography system. The key progress made on this project is the demonstration of lateral resolution less than 50nm. The lateral resolution corresponds directly to feature size when patterning a photoresist. |
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| MEMS Based Fuzing/Safety and Arming Systems |
FEB 2004 |
9 pages |
| Authors:
Paul J. Smith; NAVAL SURFACE WARFARE CENTER INDIAN HEAD DIV MD WEAPONS DEPT
|
| Microelectromechanical Systems or MEMS is a fabrication technology for creating mechanical devices on micron scale (1x10(exp-6) meters). But MEMS is more than miniaturization. By combining, photolithography, deposition, patterning and etching a fabrication technology has resulted for the production full-assembled, integrated electromechanical systems on a scale once reserved for electronic integrated circuits (IC). As the first M of MEMS implies, individual features are on the micron scale that is 10(exp-6) meters ... |
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| Representational and Inferential Requirements for Diagrammatic Reasoning in the Entity Re-Identification Task |
2004 |
3 pages |
| Authors:
B. Chandrasekaran; U. Kurup; B. Banerjee; OHIO STATE UNIV COLUMBUS DEPT OF COMPUTER SCIENCE AND ENGINEERING
|
| Diagrammatic reasoning is ubiquitous in Army reasoning: situation understanding and planning in the Army both involve representing aspects of the situation and plans in the form of diagrams. We have been developing a general architecture to support diagrammatic reasoning for Army applications, and in an earlier report 1 we discussed an application in simple maneuver recognition. Our research strategy has been to investigate a variety of applications, each bringing additional ... |
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| Thick Capacitive Meshes on Polyimide Substrates |
2004 |
6 pages |
| Authors:
Arne Lueker; Oren Sternberg; Herbert Hein; Joachim Schulz; Karl-Dieter Moeller; UNIVERSITY OF APPLIED SCIENCES MUENSTER (GERMANY)
|
| Thick capacitive meshes of nickel on substrates of thickness 25 micrometers have been produced by electroplating into a photoresist mould. The Micro-Stripes program by Flomerics has been used for the interpretation of the experimentally measured far infrared spectrum. The measured reflection resonance mode and the transmission wave guide mode agree well with the analytical predictions. |
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| Electrophotographic Solid Freeform Fabrication |
30 DEC 2003 |
40 pages |
| Authors:
Ashok Kumar; FLORIDA UNIV GAINESVILLE MECHANICAL AND AEROSPACE ENGINEERING
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| A method for solid freeform fabrication based on electrophotographic powder deposition was investigated to study its potentials and to identity design and implementation challenges. In this technique powder is printed layer- by-layer in the shape of the cross-sections of the part using electrophotography, which is a very widely used non-impact printing method. The electrophotography process involves picking and depositing powder using an electrostatically charged photoconducting surface. Each layer of powder ... |
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| Interfacial Layer Effects in Ba(1-x)Sr(x)TiO3 Thick Films Prepared by Plasma Spray |
19 NOV 2003 |
8 pages |
| Authors:
Kipyun Ahn; Bruce W. Wessels; Sanjay Sampath; NORTHWESTERN UNIV EVANSTON IL DEPT OF MATERIALS SCIENCE AND ENGINEERING
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| The dielectric properties of high k dielectric thick films prepared by thermal spray were investigated. BaTiO3 and Ba(0.68)Sr(0.32)TiO3 thick films were deposited using plasma spray on Ag-Pd screen-printed alumina substrates. The sprayed films were predominantly polycrystalline but contained an amorphous second phase. The dielectric constants of the films decreased with decreasing film thickness in 10 approx. 60 micrometer range. This was attributed to the presence of an interfacial layer between ... |
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| Direct-Write Process for UV-Curable Epoxy Materials by Inkjet Technology |
19 NOV 2003 |
8 pages |
| Authors:
W. Voit; K. V. Rao; W. Zapka; XAARJET AB JARFALLA (SWEDEN)
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| We demonstrate drop-on-demand inkjet printing technique to be a high throughput method for the patterned deposition of UV-curable epoxy materials. Different multi-nozzle printheads have been used to produce epoxy droplets with controlled volume in the range from 15 to 180 pl, and to apply the droplets with high placement accuracy. For a large dot grid pattern, which was printed by addressing 126 individual ink channels, standard deviations of sigma(x) = ... |
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| Development of PZT Suspensions for Ceramic Ink-Jet Printing |
19 NOV 2003 |
7 pages |
| Authors:
B. Derby; D. H. Lee; T. Wang; D. Hall; MANCHESTER UNIV (UNITED KINGDOM) MATERIALS SCIENCE CENTER
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| The direct ink-jet printing of ceramic powders requires the development of highly fluid suspensions of ceramic particles with viscosity |
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Printing and Graphic Arts
