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W. L. Warren


Click on the titles below to find US government-authored or -collected reports written by W. L. Warren

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POLARIZATION SUPPRESSION IN PB(ZR,TI)O(3) THIN FILMS 15 JUN 1995
Authors:  W. L. Warren; D. DIMOS; B. A. TUTTLE
The full text of this report is not available and therefore is not for sale. This information is provided for reference purposes only.SWITCHABLE POLARIZATION CAN BE SUPPRESSED IN PB(ZR,TI)O(3) THIN FILMS BY OPTICAL, THERMAL, ELECTRICAL, AND REDUCING PROCESSES. THE OPTICAL SUPPRESSION EFFECT OCCURS BY BIASING THE FERROELECTRIC NEAR THE SWITCHING THRESHOLD AND ILLUMINATING THE MATERIAL WITH BAND GAP LIGHT; THE THERMAL SUPPRESSION EFFECT OCCURS BY BIASING THE FERROELECTRIC NEAR THE SWITCHING THRESHOLD AND HEATING THE MATERIAL TO APPROXIMATELY 100 DEGREE C. THE ELECTRICITY INDUCED SUPPRESSION EFFECT, KNOWN AS ELECTRICAL FATIGUE, OCCURS BY ...


PHOTOINDUCED HYSTERESIS CHANGES AND OPTICAL STORAGE IN (PB,LA)(ZR,TI)O(3) THIN FILMS AND CERAMICS 01 OCT 1994
Authors:  D. DIMOS; W. L. Warren; M. B. SINCLAIR
The full text of this report is not available and therefore is not for sale. This information is provided for reference purposes only.PB(ZR,TI)O(3) AND (PB,LA)9ZR,TI)O(3) THIN FILMS AND BULK CERAMICS ARE SHOWN TO EXHIBIT TWO DISTINCT, BUT RELATED TYPES OF PHOTOINDUCED CHANGES IN THEIR HYSTERESIS BEHAVIOR: (1) A PHOTOINDUCED SUPPRESION OF THE SWITCHABLE POLARIZATIION AND (2) A PHOTOINDUCED VOLTAGE SHIFT. BOTH EFFEECTS GIVE RISE TO STABLE AND REPRODUCIBLE HYSTERISIS CHANGES AND, THUS. EITHER COULD BE THE BASIS OF AN OPTICAL


Electron Paramagnetic Resonance Investigation of Charge Trapping Centers in Amorphous Silicon Nitride Films. 1993
Authors:  W. L. Warren; J. Kanicki; J. Robertson; E. H. Poindexter; P. J. McWhorter; SANDIA NATIONAL LABS ALBUQUERQUE NM
The full text of this report is not available and therefore is not for sale. This information is provided for reference purposes only.We have explored the nature of the silicon dangling-bond center in amorphous hydrogenated silicon nitride (a-SiN(x):H) thin films, and its relationship to the charge trapping centers using electron paramagnetic resonance (EPR) and capacitance-voltage (C-V) measurements. We have investigated the quantitative relationship between the concentration of silicon dangling bonds using EPR and the concentration of charge traps, measured by C-V measurements, for both UV-illuminated and unilluminated a-SiN(x):H thin films subjected to ...


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