Self-aligned imprint lithography (SAIL) enables patterning and alignment of submicron-sized features on flexible substrates in the roll-to-roll (R2R) environment. Soft molds made of elastomers have been used as stamps to pattern three-dimensional masks. Durability of these stamps is one factor that limits their efficiency in a R2R process. Fluorothermoplastics are low cost imprint stamp materials with great mechanical strength and chemical compatibility but with low gas permeability that trap air ...
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