The atmospheric pressure glow discharge in nitrogen with small admixture of different organosilicon, is compounds such as hexamethyldisilazane and hexamethyldisiloxane studied by means of emission spectroscopy. The deposited films were studied by means of indentation techniques.
Diffuse dielectric barrier discharges are investigated in mixtures of nitrogen with several noble gases (He, Ne, Ar). The results show that the discharge remains in the diffuse mode at relatively high content of the noble gases, which is contrary to the admixture of oxygen to nitrogen.
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