Collaborative research was conducted by the faculty known as the Lithography Network. This network brings together world class researchers over a broad set of technology areas essential to the success of maskless lithography and non-conventional patterning. The primary faculty by task is listed below: Task 1: Electron Beam Technology for Maskless Lithography, Professor R. Fabian Pease (Coordinator); Task 2: Spatial Light Modulators for Maskless lithography, Professor Olav Solgaard (Coordinator); Professor ...
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