Several new polymers, copolymers, and polyfunctional crosslinkers that can be used to formulate chemically amplified resist materials have been prepared, characterized, and tested in combination with suitable photoactive compounds. All of the materials operate on the basis of acid catalyzed processes involving alkylation, dehydration, or isomarization reactions. Sensitivities below 0.1 mJ/cm2 have been measured with deep-UV irradiation, while most of the materials also operate very effectively with E-beam or X-ray ...
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