Fabrication of large-area photonic integrated circuits (PICs) in III-V compound semiconductors presents many fabrication complexities. One difficulty is precise and reproducible etching of ridge waveguides for accurate control of optical mode shape and coupling length (distance required for full power transfer) of optical directional couplers. Directional couplers are an important element in PICs due to their utility as power taps, splitters, and combiners. However, the exponential relationship between the depth ...
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