A thorough understanding and a well developed fabrication procedure of MIS structures are the prerequisite for charged coupled device applications. The object of this thesis is to study the narrow gap semiconductor MIS and investigate its feasibility for IR-charge coupled images applications. Two MIS studies were made. First, MIS of five lead-tin semiconductors were fabricated using E-gun evaporated 100-450A thick Al2O3 or SiO2 layers as insulators. Second, MIS of 0.05ohm-cm ...
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