This program has three sub-tasks: 1) Nitride Thin-Film Coatings, 2) Advanced Plasma Diagnostics, and 3) Studies of Charged-Particle Processes. The focus of Task 1 has been to develop amorphous carbon-nitride films utilizing controlled plasma-generated ions to increase the nitrogen concentration within the film. It is anticipated that development of films with higher concentrations of nitrogen will lead to properties similar to those theoretically calculated for crystalline β-C3N4. Successful development of ...
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