| Large-Scale Integration of Solid-State Microfluidic Valves With No Moving Parts |
JAN 2005 |
183 pages |
| Authors:
Carlos H. Mastangelo; Yogesh B. Gianchandani; J. M. Frechet; MICHIGAN UNIV ANN ARBOR
|
 | This research concerns the development of a new kind of revolutionary design, solid-state microvalves that will permit the realization of complex microfluidic systems with arrays of hundreds of flow-control devices. Microfluidic systems have widespread applications in the implementation of immunological and genetic assays of both commercial and DoD interest. While fluidic capillary microchips made of glass, silicon, and plastic have been realized, their practical use has been so far confined ... |
|
| Controlled Radical Polymerization with Dendrimers Containing Stable Radicals |
12 JUN 96 |
22 pages |
| Authors:
T. Shigemoto; K. Matyjaszewski; M. Leduc; J. M. Frechet; CARNEGIE-MELLON UNIV PITTSBURGH PA DEPT OF CHEMISTRY
|
| TEMPO-based stable radicals were attached to dendrimers of variable size and used to control radical polymerization of styrene, vinyl acetate and (meth)acrylates. Thermal polymerization of styrene with (G-2)-TEMPO proceeded in a similar but not better controlled manner than with TEMPO alone. In the polymerization of styrene initiated with BPO, the kinetics and the molecular weigh/conversion relations showed the same tendency as with TEMPO, though the polydispersity was higher than in ... |
|
| Resist Materials Design: Base-Catalyzed Chemical Amplification |
30 JUN 94 |
|
| Authors:
C. G. Willson; J. F. Cameron; S. A. MacDonald; C. P. Niesert; J. M. Frechet; CORNELL UNIV ITHACA NY DEPT OF CHEMISTRY
|
 | Many chemically amplified resists that function on the basis of acid catalysis of thermolytic actions have been described as well as systems that function on the basis of free radical chain reactions. But there have been very few reports on the use of base catalysis, of chemical transformations in resist materials. We describe here our initial results on base catalyzed chemically amplified deep-UV photoresists. Photogenerated amines were used as catalysts ... |
|
| Resist Materials Design: Base-Catalyzed Chemical Amplification |
12 MAY 93 |
16 pages |
| Authors:
C. G. Willson; J. F. Cameron; S. A. MacDonald; C. P. Niesert; J. M. Frechet; CORNELL UNIV ITHACA NY DEPT OF CHEMISTRY
|
| The search for advanced resists that can provide the high density of circuits and high throughput required for the new generations of microelectronic devices requires that highly stable chemically amplified materials be developed. In view of the high susceptibility of resists based on photoacid generation to environmental contamination, resulting in lessened performance, a program aiming at the development of chemically amplified resists utilizing photobase generation has been undertaken. In a ... |
|
| Photogenerated Base as Catalyst for Imidization Reactions: Design of Photosensitive Polyimides |
20 APR 92 |
8 pages |
| Authors:
J. M. Frechet; J. F. Cameron; C. M. Chung; S. A. Haque; C. G. Willson; CORNELL UNIV ITHACA NY BAKER LAB
|
| The photogeneration of free amines or diamines from soluble organic precursors such as photoactive 2-nitrobenzyl carbamates is useful for the imidization of polymers containing amic acid or amic ester groups as part of their main-chain or their side-chain, The base-catalyzed reaction occurs at lower temperatures than the noncatalyzed thermal process and is applicable to the patterning of thin film coatings. |
|
| Novel Chemically Amplified Dry-Developing Imaging Materials for High Resolution Microlithography |
20 APR 92 |
14 pages |
| Authors:
J. M. Frechet; J. Fahey; S. M. Lee; S. Matuszczak; Y. Shacham-Diamond; CORNELL UNIV ITHACA NY BAKER LAB
|
| Several new polymers, copolymers, and polyfunctional crosslinkers that can be used to formulate chemically amplified resist materials have been prepared, characterized, and tested in combination with suitable photoactive compounds. All of the materials operate on the basis of acid catalyzed processes involving alkylation, dehydration, or isomarization reactions. Sensitivities below 0.1 mJ/cm2 have been measured with deep-UV irradiation, while most of the materials also operate very effectively with E-beam or X-ray ... |
|
| The Photogeneration of Polymeric Amines: Synthesis and Photocrosslinking of Copolymers Containing Photoactive Carbamate Pendant Groups |
20 APR 92 |
26 pages |
| Authors:
J. E. Beecher; J. F. Cameron; J. M. Frechet; CORNELL UNIV ITHACA NY BAKER LAB
|
| Two families of copolymers containing 4-(2-NITROBENZYLOXY)-CARBAMOYL- styrene as the photoactive component, with styrene or methyl methacrylate as the other component are described. The polymers are prepared by chemical modification of copolymers of 4-amino-styrene with styrene and methyl methacrylate, respectively, using 2-nitrobenzyl chloroformate. The photoactive carbamate groups of both copoly can be removed by irradiation with UV light below 320nm. Quantum yield measurements and comparisons with small molecule model compounds confirm ... |
|
Reports by Author
