The resettable circuit breaker cantilevers use silicon dioxide (SiO2) for temperature compensation. The compressive stress in the SiO2 causes the cantilever to bow upwards 400 um after release. In the DC-DC voltage converter the gap between the electrodes is 1.4 um. After release, the cantilevers are stuck down. We devised a short loop experiment to better understand the cantilever behavior by omitting the contact metal and SiO2 layers from test ...
During this period, we began one short loop experiment to provide data for the flatness of the device silicon (Si) on the silicon-on-insulator (SOI) substrate. To complete this experiment, we processed one double-side-polished (DSP) and one SOI wafer using the same process as full wafer fabrication less the Metal 2, 4, and 5 layers. This process allows us to fabricate the cantilevers as Si-only cantilevers and verify they are flat ...
SHORT LOOP EXPERIMENTS: During this period we completed one short loop experiment to verify the use of chromium (Cr) as a hard mask for silicon dioxide (SiO2) wet etching. This Cr hard mask was used during the fabrication of the Indent layer in the process flow. For this experiment, we deposited 3-micrometers of SiO2 on the wafer and then sputtered a layer of Cr. We patterned and etched the Cr, ...
Violent extremist movements and ongoing military operations have prompted the Department of Defense (DoD) to place greater emphasis on improving language and regional proficiency, which includes cultural awareness. GAO was asked to assess the extent to which DoD has done the following: (1) developed a strategic plan to guide its language and regional proficiency transformation efforts, and (2) obtained the information it needs to identify potential language and regional proficiency ...
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